Nanoflex 400

PVD-PECVD hybrid system

Nanoflex 400 is a compact system designed for both decorative and technical applications.

Nanoflex 400 belongs to the flexible machine series, optimised for the production of small and medium-sized objects.

High flexibility is one of the most important features. In fact, different PVD and PECVD types can be installed on the chamber: Cathodic Arc, Magnetron Sputtering (in different configurations, Balanced, Unbalanced, DMS, HiPiMS) and Plasma Beam Source.

Platone-texture
Nanoflex 400

System characteristics

Characteristics

Useful volume ᴓ 850mmx400m
Internal chamber dimensions 1030x650mm
Made entirely of stainless steel
Max. temp.: 550° C
With removable shields
Industry 4.0 software

Technologies

Dry pumps
Turbomolecular pumps

Sources

LDE
RCAE
Magnetron Sputtering
Dual Magnetron Sputtering
HIPIMS
Plasma Beam Source
Other on request

Control

Industrial computer with diagnostic features
Maximum gas flow meters

 
Safety system

Numerous safety interlocks to protect operators and the system.

Certificazione-TUV-iso9001
UNI EN ISO 9001:2008

Certification N°: 50 100 12607

Our machines for PVD treatment

Our PVD coating machines ensure high productivity, low costs and innovative solutions (Cathodic Arc, Magnetron Sputtering, Plasma Beam Source etc.) based on your needs.

Latest news

Updates and insights into the latest PVD & PECVD coating technologies and our systems.