PVD – PECVD Hybrid System
With a chamber dimension of Ø 1000 x 550 mm and a deposition height of 400 mm production of small and medium size objects is optimized.
Nanoflex 400 belongs to flexible machine series.
High flexibility is one of its most important characteristics. In fact, on the machine chamber, it is possible to install different type of sources: Cathodic Arc, Magnetron Sputtering (in different configurations, Balance, Unbalanced, DMS, HiPiMS) and Plasma Beam Source.
All technologies can be provide directly before installation or as an upgrade.
Decorative and technical coatings
Loading on top
Material: Stainless Steel Chamber size: Ø 1000 x 550 mm Turntable: on bottom Loading: from top
Dry pumps Turbo molecular
Cathodic Arc Magnetron Sputtering Dual Magnetron Sputtering Plasma beam source HIPIMS
Industrial Computer with diagnostic features Gas mass flow meters
Numerous safety interlocks to protect operators and equipment